Effect of secondary annealing on Al/Ti/n-GaN/Si ohmic contacts;

二次退火對Al/Ti/n-GaN/Si歐姆接觸的影響

The key of new process focuses on 2 points:one is lower cold deformation ratio and another is 2nd annealing at lower temperature(250 , 30 min).

工藝的關(guān)鍵在于在相對低的最后一次變形率(ε=30%)條件下,進(jìn)行低溫二次退火(250℃/30min),用該工藝軋制所得銀帶在自然時(shí)效時(shí)力學(xué)性能十分穩(wěn)定。

The measure of twice stable annealing process is discussed.

采用二次穩(wěn)定化退火處理 ,解決了 Cr17Ni2鋼異質(zhì)焊接接頭刀狀腐蝕的問題。